Nanno SOLUTIONS, a DFM startup specializing in realistic, worstcase interconnect modeling, joins Si2; Announces support for OpenAccess

Membership Supports OpenAccess API and Database with Design Software for Manufacturing & Yield

Sunnyvale, Calif.-February 28, 2007-Nanno SOLUTIONS, an EDA (Electronic Design Automation) startup in the DFM/DFY (Design for Manufacturing/Yield), and the Silicon Integration Initiative (Si2) announced today that Nanno SOLUTIONS has joined Si2 and Nanno SOLUTIONS' software, Nanno-Win and Nanno-CaL, will join other EDA tools that work with the OpenAccess database.

Engineered for interoperability, the OpenAccess Application Programming Interface (API) allows its users to construct flows incorporating design tools from multiple vendors. Nanno SOLUTIONS' Nanno-Win and Nanno-CaL will be among the growing number of EDA tools that work with OpenAccess and will allow IC designers access to realistic, worstcase interconnect models that improve their DFM and DFY flows.

"Si2 welcomes Nanno SOLUTIONS as a member," remarked Steve Schulz, president and CEO, Si2. "Nanno's commitment to OpenAccess underscores the importance of having interoperable DFM and DFY tools and flows available to the worldwide IC design community."

"Joining Si2 makes OpenAccess available to us," remarked Won-Young Jung, CTO of Nanno SOLUTIONS. "A lot of EDA tools already support the OpenAccess database. The net result is that the OpenAccess interoperable environment brings the full power of interconnect modeling to IC designers in a design flow using existing EDA design tools."

Why OpenAccess?
Today's design environments are a complicated mix of design tools containing proprietary applications and associated databases, and with incompatible file formats and syntaxes, originating from different EDA vendors. IC engineers spend a significant amount of time trying to resolve tool compatibility issues. The net result is longer design cycle, more errors and less time focused in design issues. OpenAccess is the common platform to resolve these issues.
For more information about OA, please visit www.si2.org.

About Nanno SOLUTIONS & the OpenAccess API
Nanno SOLUTIONS software leverages the OpenAccess API so that any design tool integrated with the OpenAccess database can access realistic, worstcase interconnect models.

About Nanno SOLUTIONS Technology and Products
Nanno SOLUTIONS' technology uses process variation data and transforms the information into realistic values that designers understand. It provides realistic, statistical, worstcase interconnect models for RC-Delay, Crosstalk and IR-Drop. The same model can be used at the Front-End-of-Line (FEOL) and the Back-End-of-Line (BEOL) of the design flow to reduce design skew.

Nanno-WiN generates realistic, statistical, worstcase interconnect models. Nanno-CaL calculates interconnect performance and generates RCL netlists in the pre-layout design stage. Designers use these products to characterize interconnects and analyze the circuit statistically.

Nanno-WiN is the most accurate model generator for RC-Delay, Crosstalk and IR-Drop. It is based on Monte-Carlo simulation and Maximum Probability and Common Geometry methods. Nanno-WiN improves worstcase corner accuracy for RC-Delay by about 70% when compared to conventional worstcase methods.

Nanno-CaL works in the pre-layout design stage. It estimates interconnect load and calculates delay and transient time, and estimates RC-Delay, Crosstalk and IR-Drop for critical nets. It speeds up the design cycle by reducing the time for these pre-layout design tasks, and expands the interconnect macro block. Nanno-CaL also provides lumped R, C, L and distributed models for other applications. It interfaces to existing Place & Route and timing analysis software, and circuit simulators for estimation of circuit performance in the pre-layout design stage. It also can be used to optimize transistors and interconnect with circuit simulators like SPICE.

About Nanno SOLUTIONS
Nanno SOLUTIONS, Inc. was founded in 2004, is privately held, and offers yield improvement software to improve nanometer semiconductor manufacture. Its software products take the massive amount of process variation data and transform it into realistic values that designers understand. The products improve first time silicon success rate, offer better accuracy, run-time, accelerate yield and reduce design skew to improve time-to-market and time-to-profit.

The company headquarters are at 592 East Weddell Drive, suite 8, Sunnyvale, California 94089, and can be contacted by calling (Tel) 408-400-0688, or emailing info@nannosolutions.com. For more information, please visit. http://www.nannosolutions.com.

About Si2
Si2 is an organization of industry-leading semiconductor, systems, EDA, and manufacturing companies focused on improving the way integrated circuits are designed and manufactured in order to speed time to market, reduce costs, and meet the challenges of sub-micron design. Si2 is uniquely positioned to enable collaboration through a strong implementation focus driven by its member companies. Si2 focuses on developing practical technology solutions to industry challenges. Si2 represents over 100 companies involved in all parts of the silicon supply chain throughout the world.
Web site: www.si2.org