n&k Technology Introduces Ultra-Small Footprint Optical Scatterometry/Thin Film Metrology Tool; See n&k's ''LittleFoot(TM)''

SAN FRANCISCO--(BUSINESS WIRE)--July 10, 2006--n&k Technology, Inc., a manufacturer of advanced metrology equipment for the semiconductor industry, introduces its ultra-small footprint optical scatterometry/thin film metrology tool, "LittleFoot(TM)." The footprint of this fully automated system measures just 33 inches wide x 34 inches deep, which is achieved through a revolutionary patented wafer handling mechanism.

The capabilities of LittleFoot(TM) include film thickness measurement and determination of the values of n and k from 190 nm to 1000 nm with a wavelength sensitivity of 1 nm intervals. The system also measures critical dimensions (CDs) from five microns down to 45 nm and smaller, as well as trench depths, and profiles. LittleFoot(TM) is completely self-contained (no added modules are necessary), and will accomplish all these measurements simultaneously, with excellent correlation to CD Scanning Electron Microscope (CD-SEM) and Atomic Force Microscope (AFM) results.

"In order to accommodate the requirements of today's semiconductor fabs, the typical approach of other metrology vendors has been to add on different modules, thus increasing their tools' footprints," stated Dr. Rahim Forouhi, n&k founder and president.

"The wafer handling mechanism of LittleFoot(TM) revolutionizes in-system wafer transport resulting in a footprint that is about half the size of other tools," continued Dr. Rahim Forouhi. "This size reduction translates into significant savings in the construction and utilization of wafer fabrication facilities," he added.

Furthermore, LittleFoot(TM)'s Recipe Generation Wizard for complex thin film stacks and multifaceted trench structures is intuitive and very easy to use. The company's core technology, embedded in LittleFoot(TM), is based on Deep Ultra Violet -- Visible -- Near Infrared (DUV-Vis-NIR) broadband spectrophotometry with patented reflective optics, in conjunction with the Forouhi-Bloomer dispersion equations and Rigorous Coupled Wave Analysis.

About n&k Technology, Inc.

n&k Technology, Inc., Santa Clara, California, manufactures advanced metrology tools for the semiconductor, photomask, flat panel display, and data storage industries. The company's high resolution optical metrology equipment is used for film thickness, n and k, phase shift, trench depth, CD, and profile measurements. n&k Technology's equipment ranges from fully automated systems down to manual load table top units. n&k systems are field proven, production worthy, fast, accurate, and non destructive, enabling users to characterize virtually any combination of thin films, substrates, and structures. More information can be found on the company's website at www.nandk.com